LONDON — Research institute IMEC vzw (Leuven, Belgium) has reported at the VLSI Symposium an improved performance for its planar CMOS using hafnium-based high-k dielectrics and tantalum-based metal ...

LONDON — Belgian research organization IMEC has presented on a scheme to use fully-silicided (FUSI) nickel-silicide metal gates with high-k dielectric CMOS transistors at the International Electron ...

Density and speed of IC’s have increased exponentially for several decades, following a trend described by Moore’s Law. While it is accepted that this exponential improvement trend will end, it is ...

Complementary Metal-Oxide-Semiconductor (CMOS) technology is a vital part of modern electronics, used in designing and manufacturing integrated circuits (ICs) that power many digital devices. CMOS ...